Book/Report

FZJ-2018-03716

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Adsorbat-Induzierte Oberflächenspannungen

Sander, D. (Corresponding author)FZJ*

1992
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag Jülich

Please use a persistent id in citations: http://hdl.handle.net/2128/19104

Report No.: Juel-2572

Abstract: A cantilever bending experiment has bees set up to study adsorbate-induced surface stress on silicon and nickel single crystal samples. The adsorbate-induced bending of the substrate is detected using a very sensitive capacitance method. The resolution of the stress measurements was $\pm$ 20 dyn/cm and $\pm$ 100 dyn/cm, on 0.3 mm thick Si- and Ni-samples, respectively. Oxygen-induced surface stress on Si(111) and Si(100) has been investigated for substrate temperatures ranging from 300 K to 700 K. As a result of the breaking of the Si-Si bonds and the formation of Si-O-Si bonds, both surfaces exhibit a measurable stress. A linear stress vs. coverage dependence is found. The oxygen-induced surface stress on silicon is independent of the adsorption temperature. A monolayer coverage on Si(111) causes a considerable compressive stress of -7000 $\pm$ 980 dyn/cm, wheras the same oxygen coverage on Si(100) induces a small tensile stress of 260 $\pm$ 40 dyn/xm. The experimental results are in decent agreement with a simple cluster calculation using a valence-bond model. Thus, the different stress behavior can be attributed to differences in the local geometric structures of the O-SWi(111) and the O-Si/100) clusters. [...]

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Contributing Institute(s):

1. Publikationen vor 2000 (PRE-2000)

Research Program(s):

1. 899 - ohne Topic (POF3-899) (POF3-899)

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